Sputter Target
글쓴이 : 웨이퍼몰 날짜 : 2011-03-08 (화) 10:30 조회 : 3740


※ 제품설명

SPUTTERING TARGET, THIN FILM, FOIL, DEPOSITION MATERIAL, EVAPORATION MATERIAL, ROD, WIRE, BAR, SHEET, INGOT, PLATE

American Elements specializes in high purity metal shapes and Evaporation and Pre-Melted Material (Oxide and Fluoride) with the highest density and smallest grain sizes for use in chemical vapor deposition (CVD) and physical vapor deposition (PVD) for thin film, optic and electronic applications.


32.4 (A)/00.0013

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American Elements is a world leader in Sputtering Target, Foil, Rod, Wire, Bar, Sheet, Plate and < 0.5 mm Thin Film from rare earth and other electronic and optic materials. American Elements produces high purity metals and compounds with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical deposition and physical vapor deposition (PVD) display and optical applications. We also produce the rare earths and most advanced metals as cast rods and plates.


Materials are produced using crystallization, solid state and other ultra high purification processes. American Elements specializes in producing custom compositions for research and new proprietary technologies.




Sputtering Targets. Our standard target sizes range from 1" to 8" in diameter and from 2mm to 1/2" thick. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. Other shapes are available by request.

Rotatable Targets. For large area thin film deposition, American Elements produces rotatable sputtering targets by plasma deposition onto a tubular substrate and by casting. Rotatable sputtering targets are available up to 1,000 mm in length and can be produced from a number of metallic, oxide and alloy sources for use in many applications where large film areas are required, such as photovoltaic and other coatings.

All machined pieces are produced by casting oversized blanks, and machining down to required specifications. They are usually machined to tolerances of +0.010"/-0" on diameter, length or width, and +/-0.005" on thickness. Larger targets are also finished to a flatness within 0.015". We can accommodate tighter tolerances upon request.


Foils. American Elements produces rolled foils and sheets in various thicknesses and sizes. Most foils are produced from cast Ingots for use in coating and thin film Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Organometallic and Chemical Vapor Deposition (MOCVD) for specific applications such as fuel cells and solar energy. Scandium foils are produced from distilled scandium that does not contain tantalum. Thickness can range from 0.003" to approximately 2mm for all metals. Some metals can also be rolled down as thin as 0.001” for use as an evaporation source in microelectronics, optics, magnetics, MEMS, and hard resistant coatings. Piece sizes are available up to approximately 7" maximum width. Maximum lengths of about 20" can be obtained with a nominal thickness between about 0.005" and 0.020".


Rods and Plates. American Elements casts any of the rare earth metals and most other advanced material into rod, bar or plate form, as well as other machined shapes. All as-cast rods, bars and plates are produced from either the pure metal Ingots or sublimed metals. We have a variety of standard sized rod molds, from a minimum of 1/4" diameter up to 3" diameter for most rod needs. Plates are also offered in standard thicknesses, from 1/4" thick to 1" thick. Maximum rod lengths and maximum plate sizes are dependent on melt capacity and furnace room. Small diameter rods may have only a 4"-6" maximum cast length, whereas larger diameter rods may be cast up to about 16" long. Plate sizes can be cast up to a size of 24" x 16". As-cast rods or plates are saw-cut to length or final dimensions, and the metal surface may have visible flow marks.

Tubing. AE produces a complete line of fully characterized round, oval, rectangular and square seamless tubing in diameters from 0.2 to 6.0 inches and wall thicknesses from 0.003 to 0.500 inches produced from advanced and high purity metals for use in industrial and research applications in the fields of electronics, energy, medical devices and aerospace among many others. Tubing can be further processed at the customer's request to rings, washers, sleeves and sheaths. Tubing is produced from most metals including: Aluminum, Bismuth, Carbon, Cerium (as well as most other rare earths), Chromium, Cobalt, Copper, Erbium, Germanium, Gold, Indium, Iron, Magnesium, Manganese, Molybdenum, Neodymium, Nickel, Niobium, Ruthenium, Silicon, Silver, Tin, Titanium, Tungsten, Vanadium, Yttrium, Zinc, and Zirconium.



American Elements manufactures the following sputtering targets for thin film commercial, industrial and research applications, including solar energy and fuel cell applications:


Aluminium Rotatable Sputtering Target
Aluminum Chromium Sputtering Target
Aluminum Copper Silicon Sputtering Target
Aluminum Copper Sputtering Target
Aluminum Dysprosium Sputtering Target
Aluminum Erbium Sputtering Target
Aluminum Fluoride Sputtering Target
Aluminum Gadolinium Sputtering Target
Aluminum Magnesium Silicon Sputtering Target
Aluminum Magnesium Sputtering Target
Aluminum Molybdenum Sputtering Target
Aluminum Neodymium Sputtering Target
Aluminum Oxide Rotatable Sputtering Target
Aluminum Oxide Sputtering Target
Aluminum Rotatable Sputtering Target
Aluminum Samarium Sputtering Target
Aluminum Scandium Sputtering Target
Aluminum Silicon Copper Sputtering Target
Aluminum Silicon Sputtering Target
Aluminum Silver Sputtering Target
Aluminum Sputtering Target
Aluminum Tantalum Sputtering Target
Aluminum Telluride Sputtering Target
Aluminum Titanite Sputtering Target
Aluminum Vanadium Sputtering Target
Aluminum Ytterbium Sputtering Target
Aluminum Yttrium Sputtering Target
Antimony Oxide Rotatable Sputtering Target
Antimony Oxide Sputtering Target
Antimony Rotatable Sputtering Target
Antimony Sputtering Target
Antimony Telluride Sputtering Target
Arsenic Oxide Rotatable Sputtering Target
Arsenic Rotatable Sputtering Target
Arsenic Telluride Sputtering Target
Barium Fluoride Sputtering Target
Barium Oxide Rotatable Sputtering Target
Barium Rotatable Sputtering Target
Beryllium Oxide Rotatable Sputtering Target
Beryllium Oxide Sputtering Target
Beryllium Rotatable Sputtering Target
Beryllium Sputtering Target
Bismuth Fluoride Sputtering Target
Bismuth Oxide Rotatable Sputtering Target
Bismuth Rotatable Sputtering Target
Bismuth Telluride Sputtering Target
Boron Oxide Rotatable Sputtering Target
Boron Oxide Sputtering Target
Boron Rotatable Sputtering Target
Boron Sputtering Target
Boron-Carbide Sputtering Target
Cadmium Fluoride Sputtering Target
Cadmium Oxide Rotatable Sputtering Target
Cadmium Oxide Sputtering Target
Cadmium Rotatable Sputtering Target
Cadmium Sputtering Target
Cadmium Telluride Sputtering Target
Cadmium Tin Sputtering Target
Calcium Fluoride Sputtering Target
Calcium Oxide Rotatable Sputtering Target
Calcium Rotatable Sputtering Target
Calcium Silicate Sputtering Target
Calcium Telluride Sputtering Target
Cerium Copper Sputtering Target
Cerium Fluoride Sputtering Target
Cerium Gadolinium Sputtering Target
Cerium Oxide Rotatable Sputtering Target
Cerium Oxide Sputtering Target
Cerium Rotatable Sputtering Target
Cerium Samarium Sputtering Target
Cerium Silver Sputtering Target
Cerium Sputtering Target
Cerium Telluride Sputtering Target
Cerium Titanium Sputtering Target
Cesium Oxide Rotatable Sputtering Target
Cesium Telluride Sputtering Target
Chromium Aluminum Sputtering Target
Chromium Boron Sputtering Target
Chromium Copper Sputtering Target
Chromium Manganese Sputtering Target
Chromium Nickel Sputtering Target
Chromium Oxide Rotatable Sputtering Target
Chromium Oxide Sputtering Target
Chromium Rotatable Sputtering Target
Chromium Silicon Sputtering Target
Chromium Sputtering Target
Chromium Vanadium Sputtering Target
Cobalt Aluminum SputteringTarget
Cobalt Boron SputteringTarget
Cobalt Chromium Aluminum Sputtering Target
Cobalt Chromium Iron SputteringTarget
Cobalt Chromium SputteringTarget
Cobalt Gadolinium SputteringTarget
Cobalt Iron Boron SputteringTarget
Cobalt Iron Gadolinium SputteringTarget
Cobalt Iron SputteringTarget
Cobalt Nickel Chromium SputteringTarget
Cobalt Nickel SputteringTarget
Cobalt Oxide Rotatable Sputtering Target
Cobalt Oxide Sputtering Target
Cobalt Rotatable Sputtering Target
Cobalt Sputtering Target
Cobalt Telluride Sputtering Target
Cobalt Terbium SputteringTarget
Cobalt Vanadium SputteringTarget
Cobalt Zirconium SputteringTarget
Copper Aluminum Sputtering Target
Copper Chrome Sputtering Target
Copper Fluoride Sputtering Target
Copper Gallium Selenide Sputtering Target
Copper Gallium Sputtering Target
Copper Germanium Sputtering Target
Copper Indium Gallium Selenide Sputtering Target
Copper Indium Selenide Sputtering Target
Copper Indium Sputtering Target
Copper Nickel Sputtering Target
Copper Oxide Rotatable Sputtering Target
Copper Oxide Sputtering Target
Copper Rotatable Sputtering Target
Copper Selenide Sputtering Target
Copper Sputtering Target
Copper Telluride Sputtering Target
Copper Zinc Sputtering Target
Dysprosium Cobalt Sputtering Target
Dysprosium Fluoride Sputtering Target
Dysprosium Iron Cobalt Sputtering Target
Dysprosium Iron Sputtering Target
Dysprosium Oxide Rotatable Sputtering Target
Dysprosium Oxide Sputtering Target
Dysprosium Rotatable Sputtering Target
Dysprosium Sputtering Target
Dysprosium Telluride Sputtering Target
Erbium Fluoride Sputtering Target
Erbium Oxide Rotatable Sputtering Target
Erbium Rotatable Sputtering Target
Europium Fluoride Sputtering Target
Europium Oxide Rotatable Sputtering Target
Europium Rotatable Sputtering Target
Europium Telluride Sputtering Target
Gadolinium Cerium Sputtering Target
Gadolinium Erbium Silicon Sputtering Target
Gadolinium Fluoride Sputtering Target
Gadolinium Iron Cobalt Sputtering Target
Gadolinium Iron Sputtering Target
Gadolinium Oxide Rotatable Sputtering Target
Gadolinium Oxide Sputtering Target
Gadolinium Rotatable Sputtering Target
Gadolinium Sputtering Target
Gadolinium Telluride Sputtering Target
Gadolinium Terbium Sputtering Target
Gadolinium Titanium Sputtering Target
Gallium Fluoride Sputtering Target
Gallium Oxide Rotatable Sputtering Target
Gallium Rotatable Sputtering Target
Gallium(II) Telluride Sputtering Target
Gallium(III) Telluride Sputtering Target
Germanium Antimony Sputtering Target
Germanium Oxide Rotatable Sputtering Target
Germanium Rotatable Sputtering Target
Germanium Telluride Sputtering Target
Gold Antimony Sputtering Target
Gold Copper Sputtering Target
Gold Germanium Sputtering Target
Gold Oxide Rotatable Sputtering Target
Gold Rotatable Sputtering Target
Gold Silicon Sputtering Target
Gold Telluride Sputtering Target
Gold Tin Sputtering Target
Hafnium Carbide Sputtering Target
Hafnium Iron Sputtering Target
Hafnium Oxide Rotatable Sputtering Target
Hafnium Oxide Sputtering Target
Hafnium Rotatable Sputtering Target
Hafnium Sputtering Target
Hafnium Telluride Sputtering Target
Hafnium Yttrium Sputtering Target
Holmium Copper Sputtering Target
Holmium Fluoride Sputtering Target
Holmium Oxide Rotatable Sputtering Target
Holmium Rotatable Sputtering Target
Holmium Telluride Sputtering Target
Indium Antimony Sputtering Target
Indium Fluoride Sputtering Target
Indium Oxide Rotatable Sputtering Target
Indium Oxide Sputtering Target
Indium Rotatable Sputtering Target
Indium Selenide Sputtering Target
Indium Sputtering Target
Indium Telluride Sputtering Target
Indium(III) Telluride Sputtering Target
Indium Tin Sputtering Target
Indium Zinc Sputtering Target
Indium-Tin Sputtering Target
Iridium Oxide Rotatable Sputtering Target
Iridium Oxide Sputtering Target
Iridium Rotatable Sputtering Target
Iridium Sputtering Target
Iridium Telluride Sputtering Target
Iron Aluminum Sputtering Target
Iron Boron Sputtering Target
Iron Cobalt Sputtering Target
Iron Fluoride Sputtering Target
Iron Gadolinium Sputtering Target
Iron Hafnium Sputtering Target
Iron Manganese Sputtering Target
Iron Nickel Sputtering Target
Iron Oxide Rotatable Sputtering Target
Iron Oxide Sputtering Target
Iron Rotatable Sputtering Target
Iron Silicon Sputtering Target
Iron Sputtering Target
Iron Telluride Sputtering Target
Lanthanum Aluminum Sputtering Target
Lanthanum Fluoride Sputtering Target
Lanthanum Nickel Sputtering Target
Lanthanum Oxide Rotatable Sputtering Target
Lanthanum Oxide Sputtering Target
Lanthanum Rotatable Sputtering Target
Lanthanum Sputtering Target
Lanthanum Strontium Manganite Sputtering Target
Lanthanum Telluride Sputtering Target
Lead Oxide Rotatable Sputtering Target
Lead Rotatable Sputtering Target
Lead Telluride Sputtering Target
Lithium Oxide Rotatable Sputtering Target
Lithium Rotatable Sputtering Target
Lithium Telluride Sputtering Target
Lutetium Fluoride Sputtering Target
Lutetium Oxide Rotatable Sputtering Target
Lutetium Rotatable Sputtering Target
Lutetium Telluride Sputtering Target
Magnesium Aluminum Sputtering Target
Magnesium Calcium Sputtering Target
Magnesium Dysprosium Sputtering Target
Magnesium Fluoride Sputtering Target
Magnesium Gadolinium Sputtering Target
Magnesium Indium Sputtering Target
Magnesium Neodymium Sputtering Target
Magnesium Neodymium Zirconium Yttrium Sputtering Target
Magnesium Oxide Rotatable Sputtering Target
Magnesium Oxide Sputtering Target
Magnesium Rotatable Sputtering Targets
Magnesium Samarium Sputtering Target
Magnesium Sputtering Target
Magnesium Telluride Sputtering Target
Magnesium Yttrium Sputtering Target
Magnesium Zirconium Sputtering Target
Manganese Iron Sputtering Target
Manganese Nickel Sputtering Target
Manganese Oxide Rotatable Sputtering Target
Manganese Oxide Sputtering Target
Manganese Rotatable Sputtering Targets
Manganese Sputtering Target
Manganese Telluride Sputtering Target
Molybdenum Chromium Sputtering Target
Molybdenum Oxide Rotatable Sputtering Target
Molybdenum Oxide Sputtering Target
Molybdenum Rotatable Sputtering Target
Molybdenum Silicon Sputtering Target
Molybdenum Sputtering Target
Molybdenum Telluride Sputtering Target
Neodymium Fluoride Sputtering Target
Neodymium Iron Boron Sputtering Target
Neodymium Oxide Rotatable Sputtering Target
Neodymium Rotatable Sputtering Target
Neodymium Silver Sputtering Target
Neodymium Telluride Sputtering Target
Nickel Aluminum Sputtering Target
Nickel Chrome Sputtering Target
Nickel Chromium Aluminum Sputtering Target
Nickel Chromium Silicon Sputtering Target
Nickel Chromium Sputtering Target
Nickel Copper Sputtering Target
Nickel Iron Sputtering Target
Nickel Manganese Sputtering Target
Nickel Oxide Rotatable Sputtering Target
Nickel Oxide Sputtering Target
Nickel Platinum Sputtering Target
Nickel Rotatable Sputtering Target
Nickel Sputtering Target
Nickel Telluride Sputtering Target
Nickel Titanium Sputtering Target
Nickel Tungsten Sputtering Target
Nickel Vanadium Sputtering Target
Nickel Vanadium Zirconium Sputtering Target
Nickel Ytterbium Sputtering Target
Nickel Zirconium Sputtering Target
Niobium Oxide Rotatable Sputtering Target
Niobium Rotatable Sputtering Target
Niobium Sputtering Target
Niobium Telluride Sputtering Target
Niobium Titanium Sputtering Target
Osmium Oxide Rotatable Sputtering Target
Osmium Rotatable Sputtering Target
Osmium Telluride Sputtering Target
Palladium Telluride Sputtering Target
Platinum Oxide Rotatable Sputtering Target
Platinum Rotatable Sputtering Target
Platinum Telluride Sputtering Target
Praseodymium Fluoride Sputtering Target
Praseodymium Oxide Rotatable Sputtering Target
Praseodymium Oxide Sputtering Target
Praseodymium Rotatable Sputtering Target
Praseodymium Sputtering Target
Praseodymium Telluride Sputtering Target
Rhenium Oxide Rotatable Sputtering Target
Rhenium Rotatable Sputtering Target
Rhenium Telluride Sputtering Target
Rhodium Oxide Rotatable Sputtering Target
Rhodium Oxide Sputtering Target
Rhodium Rotatable Sputtering Targets
Rhodium Sputtering Target
Rhodium Telluride Sputtering Target
Ruthenium Oxide Rotatable Sputtering Target
Ruthenium Rotatable Sputtering Target
Ruthenium Telluride Sputtering Target
Samarium Cobalt Sputtering Target
Samarium Fluoride Sputtering Target
Samarium Iron Sputtering Target
Samarium Oxide Rotatable Sputtering Target
Samarium Oxide Sputtering Target
Samarium Rotatable Sputtering Targets
Samarium Sputtering Target
Samarium Telluride Sputtering Target
Samarium Zirconium Sputtering Target
Scandium Fluoride Sputtering Target
Scandium Nickel Sputtering Target
Scandium Oxide Rotatable Sputtering Target
Scandium Oxide Sputtering Target
Scandium Rotatable Sputtering Targets
Scandium Sputtering Target
Scandium Telluride Sputtering Target
Scandium Zirconium Sputtering Target
Selenium Oxide Rotatable Sputtering Target
Selenium Rotatable Sputtering Target
Selenium Telluride Sputtering Target
Silicon Aluminum Oxide Rotatable Sputtering Target
Silicon Aluminum Rotatable Sputtering Target
Silicon Carbide Sputtering Target
Silicon Oxide Rotatable Sputtering Target
Silicon Rotatable Sputtering Target
Silicon Telluride Sputtering Target
Silver Aluminum Sputtering Target
Silver Copper Sputtering Target
Silver Fluoride Sputtering Target
Silver Lanthanum Sputtering Target
Silver Lutetium Sputtering Target
Silver Magnesium Sputtering Target
Silver Oxide Rotatable Sputtering Target
Silver Oxide Sputtering Target
Silver Rotatable Sputtering Target
Silver Sputtering Target
Silver Telluride Sputtering Target
Silver Tin Sputtering Target
Strontium Fluoride Sputtering Target
Strontium Oxide Rotatable Sputtering Target
Strontium Rotatable Sputtering Target
Strontium Telluride Sputtering Target
Tantalum Aluminum Sputtering Target
Tantalum Molybdenum Sputtering Target
Tantalum Oxide Rotatable Sputtering Target
Tantalum Oxide Rotatable Sputtering Target
Tantalum Oxide Sputtering Target
Tantalum Rotatable Sputtering Target
Tantalum Rotatable Sputtering Target
Tantalum Sputtering Target
Tantalum Telluride Sputtering Target
Tellurium Oxide Rotatable Sputtering Target
Tellurium Oxide Sputtering Target
Tellurium Rotatable Sputtering Targets
Tellurium Sputtering Target
Terbium Dysprosium Iron Sputtering Target
Terbium Dysprosium Sputtering Target
Terbium Fluoride Sputtering Target
Terbium Gadolinium Iron Cobalt Sputtering Target
Terbium Iron Cobalt Sputtering Target
Terbium Iron Sputtering Target
Terbium Oxide Rotatable Sputtering Target
Terbium Oxide Sputtering Target
Terbium Rotatable Sputtering Targets
Terbium Sputtering Target
Terbium Telluride Sputtering Target
Thallium Oxide Rotatable Sputtering Target
Thallium Rotatable Sputtering Target
Thallium Telluride Sputtering Target
Thorium Oxide Rotatable Sputtering Target
Thorium Rotatable Sputtering Target
Thorium Telluride Sputtering Target
Thulium Fluoride Sputtering Target
Thulium Oxide Rotatable Sputtering Target
Thulium Rotatable Sputtering Target
Thulium Telluride Sputtering Target
Tin Oxide Rotatable Sputtering Target
Tin Rotatable Sputtering Target
Tin Telluride Sputtering Target
Titanium Aluminum Chromium Sputtering Target
Titanium Aluminum Sputtering Target
Titanium Aluminum Vanadium Sputtering Target
Titanium Aluminum Yttrium Sputtering Target
Titanium Carbide Sputtering Target
Titanium Chromium Sputtering Target
Titanium Cobalt Sputtering Target
Titanium Nickel Sputtering Target
Titanium Oxide Rotatable Sputtering Target
Titanium Oxide Rotatable Sputtering Target
Titanium Oxide Sputtering Target
Titanium Rotatable Sputtering Target
Titanium Silicon Sputtering Target
Titanium Silicon Sputtering Target
Titanium Sputtering Target
Titanium Tungsten Sputtering Target
Titanium Zirconium Sputtering Target
Tungsten Carbide Sputtering Target
Tungsten Oxide Rotatable Sputtering Target
Tungsten Oxide Sputtering Target
Tungsten Rotatable Sputtering Target
Tungsten Silicon Sputtering Target
Tungsten Sputtering Target
Tungsten Titanium Sputtering Target
Vanadium Aluminum Sputtering Target
Vanadium Chromium Sputtering Target
Vanadium Cobalt Sputtering Target
Vanadium Copper Sputtering Target
Vanadium Iron Sputtering Target
Vanadium Molybdenum Sputtering Target
Vanadium Nickel Sputtering Target
Vanadium Oxide Rotatable Sputtering Target
Vanadium Oxide Sputtering Target
Vanadium Rotatable Sputtering Targets
Vanadium Sputtering Target
Vanadium Titanium Aluminum Sputtering Target
Vanadium Titanium Sputtering Target
Ytterbium Fluoride Sputtering Target
Ytterbium Oxide Rotatable Sputtering Target
Ytterbium Oxide Sputtering Target
Ytterbium Rotatable Sputtering Targets
Ytterbium Sputtering Target
Yttria Stabilized Zirconia Sputtering Target
Yttrium Aluminum Oxide Sputtering Target
Yttrium Fluoride Sputtering Target
Yttrium Oxide Rotatable Sputtering Target
Yttrium Oxide Sputtering Target
Yttrium Rotatable Sputtering Target
Yttrium Sputtering Target
Yttrium Titanium Sputtering Target
Yttrium Zirconium Magnesium Sputtering Target
Yttrium Zirconium Sputtering Target
Zinc Aluminium Rotatable Sputtering Target
Zinc Aluminum Oxide Rotatable Sputtering Target
Zinc Aluminum Sputtering Target
Zinc Fluoride Sputtering Target
Zinc Oxide Rotatable Sputtering Target
Zinc Oxide Sputtering Target
Zinc Rotatable Sputtering Target
Zinc Sputtering Target
Zinc-Telluride Sputtering Target
Zirconium Aluminum Sputtering Target
Zirconium Cerium Sputtering Target
Zirconium Copper Sputtering Target
Zirconium Gadolinium Sputtering Target
Zirconium Oxide Rotatable Sputtering Target
Zirconium Oxide Sputtering Target
Zirconium Rotatable Sputtering Target
Zirconium Silicon Sputtering Target
Zirconium Sputtering Target
Zirconium Titanium Sputtering Target
Zirconium Yttrium Sputtering Target

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